Quartz Tube Semiconductor Grade Clear Fused Silica For Diffusion Furnace Wafer Process Vacuum Sealing Laboratory Custom Size
उत्पाद विवरण
| घनत्व: | 2.2g/cm3 | गलनांक: | 1750-1850 ℃ |
|---|---|---|---|
| एनालिंग प्वाइंट: | 1180 ℃ | सामग्री: | SiO2> 99.99% |
| तनाव बिंदु: | 1100℃ | कठोरता: | मोर्स 6.5 |
उत्पाद वर्णन
उत्पाद हाइलाइट्स
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